|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 10 of 45 found articles
| Title: |
Diffusion Barrier Behaviors of V-Ta, V-Ta-N and V-Ta/V-Ta-N Alloy Films in Cu Interconnects |
| Author: |
Lu, Y. Xiao, Y. X. Dai, T. Wang, C. P. Yang, S. Y. Liu, X. J. |
| Appeared in: |
Journal of electronic materials |
| Paging: | Volume 49 () nr. 7 pages 4231-4236 |
| Year: |
2020-04-17 |
| Contents: | |
| Publisher: |
Springer US, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 10 of 45 found articles
| << previous | next >> |